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About This Item

 

Full Description

1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

 

Document History

  1. ASTM F1709-97(2016)

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    Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2023)

    • Most Recent
  2. ASTM F1709-97(2008)


    Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

    • Historical Version
  3. ASTM F1709-97(2002)


    Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

    • Historical Version
  4. ASTM F1709-97


    Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

    • Historical Version