This standard was transferred to SEMI (www.semi.org) May 2003

1.1 This practice covers the preparation of an optical microscope for dimensional measurements. It is intended for preparing an optical microscope to measure the width of lines, in the range from 0.5 to 12 [mu]m, inclusive, on hard-surface photomasks and processed silicon wafers.

1.2 This practice is applicable for a microscope equipped with a micrometer attachment, such as an optical filar, video filar, optical image-shearing with optical or video display, optical image-scanning, or video image-scanning micrometer. Adjustment and calibration of the micrometer attachment is not included in this practice.

1.3 This practice is intended for observing optically transparent specimens in bright-field transmitted illumination or optically opaque specimens in bright-field reflected illumination. It is not intended for dark-field illumination.

1.4 This practice is limited to an optical microscope with an illumination system that is an integral part of the microscope body and includes a condenser lens.

1.5 No useful figure capable of showing the arrangement of components for all microscope designs is available; therefore, this practice does not contain illustrations and procedures which would suggest a specific microscope.

1.6 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. For more specific hazard statements, see Note 7, Note 8, and Note 17.