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ASTM E670 2009 Edition, August 1, 2009
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Standard Test Method for Testing Side Force Friction on Paved Surfaces Using the Mu-Meter
Includes all amendments and changes through Reapproval Notice , 2015
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This test method covers the measurement of the side force friction of paved surfaces utilizing a device commonly called a Mu-Meter.2

This test method utilizes a measurement obtained by pulling the Mu-Meter, containing two freely rotating test wheels angled to the direction of motion, over a pavement surface at a constant speed while the test wheels are under a constant static load. This method provides data of the side force friction (and other data) along the whole length of the test surface being tested which is applied to a variety of computerized algorithms enabling the production of results including (but not limited to) rolling averages, numeric and graphical representations, friction mapping and reports formatted in the layout approved by a wide variety of national airport regulators.

The values stated in inch-pound units are to be regarded as standard. The values given in parentheses are mathematical conversions to SI units that are provided for information only and are not considered standard.

This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. See also Section 6.

2 The sole source of supply of the apparatus known to the committee at this time is Douglas Equipment Ltd, Douglas House, Village Road, Arle, Cheltenham, Gloucestershire UK GL51 0AB and Douglas Equipment International, 8305 Cherokee Boulevard, Douglasville, Douglas County, Atlanta, Georgia 30134 USA. If you are aware of alternative suppliers, please provide this information to ASTM International Headquarters. Your comments will receive careful consideration at a meeting of the responsible technical committee,1 which you may attend.