2004 Edition, November 1, 2004
Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
Includes all amendments and changes through Change/Amendment , November 1, 2004
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Description / Abstract:
This practice describes a simple and approximate method for
determining the current density
distribution of ion beams. The practice is limited to ion beams of
diameter greater than 0.5 mm of
the type used for sputtering of solid surfaces to obtain sputter depth
profiles. It is assumed that
the ion-beam current density is symmetrical about the beam axis.