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ASTM E684

2004 Edition, November 1, 2004

Complete Document

Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces

Includes all amendments and changes through Change/Amendment , November 1, 2004


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Superseded By:

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Additional Comments:
W/D S/S BY ASTM E 1577
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Product Details:

  • Revision: 2004 Edition, November 1, 2004
  • Published Date: November 1, 2004
  • Status: Superseded By:
  • Document Language: English
  • Published By: ASTM International (ASTM)
  • Page Count: 2
  • ANSI Approved: No
  • DoD Adopted: No

Description / Abstract:

This practice describes a simple and approximate method for determining the current density distribution of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.

This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.