2002 Edition, December 10, 2002
Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption with Short Baseline
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Description / Abstract:
This test method covers the determination of the interstitial oxygen
content of single crystal
silicon by measurement of an infrared absorption band at room
temperature. This test method
requires the use of an oxygen-free reference specimen. It is
recommended that a reference material,
such as NIST SRM 2551, another certified reference material for oxygen
content of silicon, or
reference materials traceable to the CRMs, be used to calibrate the
spectrophotometer in order to