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ASTM F1709

1997 Edition, December 10, 1997

Complete Document

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

Includes all amendments and changes through Reapproval Notice , 2016

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Product Details:

  • Revision: 1997 Edition, December 10, 1997
  • Published Date: January 2016
  • Status: Active, Most Current
  • Document Language: English
  • Published By: ASTM International (ASTM)
  • Page Count: 3
  • ANSI Approved: No
  • DoD Adopted: No

Description / Abstract:

This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.