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ASTM F518

77th Edition, 1982

Complete Document

Standard Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Blanks and Semiconductor Wafers During Etching

Includes all amendments and changes through Editorial Change 1, February 1991


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Product Details:

  • Revision: 77th Edition, 1982
  • Published Date: February 1991
  • Status: Not Active, See comments below
  • Document Language: English
  • Published By: ASTM International (ASTM)
  • Page Count: 5
  • ANSI Approved: No
  • DoD Adopted: No

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