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Synthesis Properties and Applications of Oxide Nanomaterials Complete Document

2007 Edition, January 1, 2007

Complete Document



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Active, Most Current

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ISBN: 9780471724056
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Product Details:

  • Revision: 2007 Edition, January 1, 2007
  • Published Date: January 2007
  • Status: Active, Most Current
  • Document Language: English
  • Published By: John Wiley and Sons (WILEY)
  • Page Count: 746
  • ANSI Approved: No
  • DoD Adopted: No

Description / Abstract:

Introduction

CVD is a general term applied to the deposition of solid materials from chemical precursors in the vapor phase. The CVD process for compound formation involves reaction between a volatile precursor of the material to be deposited with other reactive gases. The process may employ various gaseous, liquid, or solid chemicals as sources of the elements of which the film is to be made. The reaction results in the production of a nonvolatile solid that deposits on an appropriately placed substrate to form either particles or a thin film. CVD processes have been used in various industrial applications and technologies such as the fabrication of electronic devices, the manufacture of cutting tools, and the formation of nanoparticles.

In this section, several topics related to the CVD process will be explained, including reaction types, system design, growth mechanisms, and examples of reactions.

This section is divided into the following subsections:

1. Types of CVD processes

2. CVD systems and requirements

3. Particle growth mechanism